主要特點(diǎn)Main features

　　該設(shè)備爐管可360度旋轉(zhuǎn)，管內(nèi)壁有石英擋片幫助粉料翻轉(zhuǎn)有助于燒結(jié)得更均勻;

　　The tube of the equipment can be rotated 360 degrees, and the quartz baffle on the inner wall of the tube helps the powder to be turned over to help the sintering to be more uniform;

　　可左右大角度傾斜，方便出放料，傾斜角度在0~35°之間;

　　It can be tilted from left to right at a large angle to facilitate the discharge. The tilt angle is between 0~35°.

　　該款設(shè)備是全自動(dòng)Plasma增強(qiáng)CVD系統(tǒng)(PECVD)，連續(xù)可控溫度以及Plasma強(qiáng)度等，配備真空系統(tǒng)，可以實(shí)現(xiàn)低壓條件下的實(shí)驗(yàn)，針對(duì)低溫石墨烯、碳納米管生長(zhǎng)等。PECVD系統(tǒng)能使整個(gè)實(shí)驗(yàn)腔體都處于輝光產(chǎn)生區(qū)，輝光均勻等效，這種技術(shù)很好的解決了傳統(tǒng)等離子工作不穩(wěn)定狀態(tài)，這樣離子化的范圍和強(qiáng)度是傳統(tǒng)PECVD的百倍，并解決了物料不均勻堆積現(xiàn)象;

　　The device is a fully automated Plasma Enhanced CVD System (PECVD),can achieve continuous sliding temperature zones and to continuously control the temperature and plasma intensity.Equipped with vacuum unit,can realize experiments under low pressure conditions, such as low temperature graphene and carbon nanotube growth. PECVD system enables the entire experimental cavity to be in the glow generation area, and the glow is evenly equivalent. This technique solves the unstable state of the traditional plasma operation, so the range and intensity of ionization. It is a hundred times more than traditional PECVD and solves the problem of uneven material accumulation.

　　本款設(shè)備可以做金屬?gòu)?fù)合石墨烯材料，是目前的金屬?gòu)?fù)合材料制備設(shè)備。

　　Used for prepare metal composite graphene material,is the most high-end preparation equipment for metal composite material

　　技術(shù)參數(shù)Technical Parameters